Spin Development Machine - Company Ranking(5 companies in total)
Last Updated： Aggregation Period:Feb 11, 2026〜Mar 10, 2026
This ranking is based on the number of page views on our site.
Display Company Information
| Company Name | Featured Products | ||
|---|---|---|---|
| Product Image, Product Name, Price Range | overview | Application/Performance example | |
| 【Features】 ■Device Dimensions 1200W×1100D×2000H (200CBT) 1500W×1100D×2000H (300CBT) ■Work Size Wafer φ4″ to φ8″ (300CBT max φ12″) ... | For more details, please contact us. | ||
| 【Features】 ■Device Dimensions 1700W×1300D×1400H ■Work Size Wafer φ4″～φ8″ Mask □4″～□6″ ■Options Chemical Supply Unit □For more det... | For more details, please contact us. | ||
| 【Features】 ■Device Dimensions 2000W × 1200D × 2000H (200WCBT) 2000W × 1500D × 2000H (300WCBT) ■Work Size Wafer φ4″ to φ8″ (300CBT m... | For more details, please contact us. | ||
|
---
--- |
--- | ||
カナメックス 厚木工場
-
- Featured Products
-
Single-sheet spin developing machine WSD-200CBT/WSD-300CBT
- overview
- 【Features】 ■Device Dimensions 1200W×1100D×2000H (200CBT) 1500W×1100D×2000H (300CBT) ■Work Size Wafer φ4″ to φ8″ (300CBT max φ12″) ...
- Application/Performance example
- For more details, please contact us.
Organic solvent-based spin development device WSD-200T
- overview
- 【Features】 ■Device Dimensions 1700W×1300D×1400H ■Work Size Wafer φ4″～φ8″ Mask □4″～□6″ ■Options Chemical Supply Unit □For more det...
- Application/Performance example
- For more details, please contact us.
Sheet-type automatic spin developing device
- overview
- 【Features】 ■Device Dimensions 2000W × 1200D × 2000H (200WCBT) 2000W × 1500D × 2000H (300WCBT) ■Work Size Wafer φ4″ to φ8″ (300CBT m...
- Application/Performance example
- For more details, please contact us.
-
カナメックス 厚木工場
Membership (free) is required to view all content.
Already a Member? Log In Here
